At a semiconductor equipment exhibition, Amies Technology announced the official shipment of its independently developed AST6200 stepper lithography machine. This equipment achieves a processing line width of 350 nanometers, filling the gap in China's mid - to low-end lithography equipment market and providing a domestic alternative solution for the power semiconductor and other sectors.
The core competitiveness of the AST6200 lies in its three major advantages of "precision, cost-effectiveness, and service":
- Precision: It adopts an independently developed "dual - optical path interference positioning system" with a positioning accuracy of ±0.5 micrometers. Meanwhile, it uses a mercury - lamp - based ultraviolet light source to meet the requirements of multiple application scenarios.
- Cost-effectiveness: Its price is only 60% of that of similar imported equipment.
- Service: The response time for after-sales service has been shortened to within 4 hours. Moreover, the localization rate of its core components reaches 85%. Specifically, its optical lenses are supplied by the Changchun Institute of Optics, Fine Mechanics and Physics, and its precision workbench is driven by Han's Motor. Additionally, its delivery cycle is merely one-third of that of imported equipment.
Currently, the equipment has secured an initial order of 20 units from power chip manufacturers such as Silan Microelectronics and Star Semiconductor. It will be mainly used in the gate lithography process of IGBT chips. The chairman of Amies Technology stated that the company will next focus on developing equipment for the 280nm process, with key efforts to make breakthroughs in deep ultraviolet light source technology. It plans to achieve the domestic replacement of mid - to high-end lithography equipment by 2027, so as to further improve the domestic semiconductor equipment industrial chain.
