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Photolithography Photomasks
Photolithography Photomasks

Substrate Material: Soda-lime glass, quartz glass

产品特点

Dimensions: Customized pattern dimension design

Appearance Standards: No scratches, no chipping, etc. (visual inspection)

产品性能

Optical Characteristics: Customized coating system design for any specified wavelength range (coating types: Ag, Al, Cr, SiO₂, TiO₂, etc.)


技术规格

CD Precision: 0.5μm

Minimum Line Width: 2μm

Processing Size: 4-8 inches

0.119662s